Pushing the limits of EUV mask repair: addressing sub-10 nm defects with the next generation e-beam-based mask repair tool

Autor:	Hubertus Marbach, Horst Schneider, Renzo Capelli, Johannes Schöneberg, Tilmann Heil, Fan Tu, Michael Waldow, Laura Ahmels
Rok vydání:	2021
Předmět:	Materials science Optics business.industry Extreme ultraviolet lithography Electron beam processing business
Zdroj:	Journal of Micro/Nanopatterning, Materials, and Metrology. 20
ISSN:	2708-8340
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::97310432bc94a6b47b762f5470e2dddf https://doi.org/10.1117/1.jmm.20.3.031013 Zobrazit plný text záznamu