Fabrication of integrated metallic MEMS devices

Autor:	Ole Hansen, Jan Tue Ravnkilde, Arda D. Yalcinkaya
Rok vydání:	2002
Předmět:	Microelectromechanical systems Materials science Fabrication business.industry Hardware_PERFORMANCEANDRELIABILITY CMOS Hardware_GENERAL Hardware_INTEGRATEDCIRCUITS Electronic engineering Optoelectronics Electrical and Electronic Engineering business Electroplating Hardware_LOGICDESIGN
Zdroj:	Electronics Letters. 38:1526
ISSN:	0013-5194
Popis:	A simple and complementary metal oxide semiconductor (CMOS) compatible fabrication technique for microelectromechanical (MEMS) devices is presented. The fabrication technology makes use of electroplated metal layers. Among the fabricated devices, high quality factor microresonators are characterised with respect to the quality factor.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::970e2785215e14446bff998f25c7e28f https://doi.org/10.1049/el:20021032 Zobrazit plný text záznamu