Anisotropic etching for optical gratings
| Autor: | K. Kühl, A. Klumpp, Walter Lang, H.U. Käufl, U. Schaber |
|---|---|
| Rok vydání: | 1995 |
| Předmět: |
Materials science
Anisotropic etching Silicon Spectrometer Physics::Instrumentation and Detectors Orientation (computer vision) business.industry Metals and Alloys Physics::Optics chemistry.chemical_element Condensed Matter Physics Computer Science::Other Surfaces Coatings and Films Electronic Optical and Magnetic Materials Crystal Optics Quality (physics) chemistry Etching (microfabrication) Electrical and Electronic Engineering business Instrumentation Diffraction grating |
| Zdroj: | Sensors and Actuators A: Physical. 51:77-80 |
| ISSN: | 0924-4247 |
| DOI: | 10.1016/0924-4247(95)01074-2 |
| Popis: | Silicon gratings can be used for IR-optical spectrometers. The gratings are realized by anisotropic etching of silicon. To obtain an optimum surface quality of the etched planes, the orientation of the mask versus the crystal must be very exact. This can be realized using a two-step etching process. The technology of the gratings and the optical characterisation are presented together with examples for astronomical application. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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