Ion Diffusion in Chemically Amplified Resists
| Autor: | Gila E. Stein, Manolis Doxastakis, Tanguy Terlier, Christopher M. Bottoms |
|---|---|
| Rok vydání: | 2021 |
| Předmět: |
Materials science
Polymers and Plastics 02 engineering and technology 010402 general chemistry 01 natural sciences Ion Inorganic Chemistry Chemical kinetics Materials Chemistry Diffusion (business) Lithography chemistry.chemical_classification business.industry Organic Chemistry technology industry and agriculture Polymer equipment and supplies 021001 nanoscience & nanotechnology 0104 chemical sciences Semiconductor Chemical engineering chemistry Resist Scientific method 0210 nano-technology business |
| Zdroj: | Macromolecules. 54:1912-1925 |
| ISSN: | 1520-5835 0024-9297 |
| DOI: | 10.1021/acs.macromol.0c02052 |
| Popis: | The acid-catalyzed deprotection of glassy polymer resins is an important process in semiconductor lithography. Studies have shown that the reaction kinetics in these materials is controlled by slow... |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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