Effective suppression of internal stresses in Co-Cr films using a mixture of Ar and Kr as the sputtering gas

Autor:	Shigeki Nakagawa, M. Naoe
Rok vydání:	1993
Předmět:	Materials science Gas pressure Chemical engineering Sputtering Deposition (phase transition) Thin film Condensed Matter Physics Internal stress Chromium-Cobalt Alloys Electronic Optical and Magnetic Materials
Zdroj:	Journal of Magnetism and Magnetic Materials. 120:345-348
ISSN:	0304-8853
DOI:	10.1016/0304-8853(93)91358-e
Popis:	A lower sputtering gas pressure during the sputtering process tends to result in the deposition of denser Co-Cr films, but also increases compressive internal stresses when a mixture of Ar and Kr is used as the sputtering gas. The internal stresses have been reduced with an increase in the ratio of Kr in the gas mixture.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::96e2c9a672f6cc667983c8c38bb3cc0a https://doi.org/10.1016/0304-8853(93)91358-e Zobrazit plný text záznamu