| Autor: |
Peter Theodorus Maria Giesen, Wim J. M. de Laat, Cheng-Qun Gui, Maria Peter, François Furthner, Erwin R. Meinders |
| Rok vydání: |
2008 |
| Předmět: |
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| Zdroj: |
SPIE Proceedings. |
| ISSN: |
0277-786X |
| Popis: |
In this paper we report the use of projection optical lithography to pattern micron-sized features on 100 μm thick PEN foils. A foil-on-carrier lamination process was developed to ensure a good dimensional stability during the lithographic processing and imaging of the foil. A stepper based leveling metrology was used in characterizing the surface flatness of the foil-on-carriers. A lithography process was developed to image micron and submicron patterns on foil substrates. The process window for 1-10 μm features was determined from focus and exposure energy experiments. The lithographic study indicated a reproducible and excellent imaging accuracy for patterning micron-sized features on flexible substrates. This makes the technology very suitable for the manufacturing of electronic devices with critical dimensions in the micron and submicron range. In addition, we made transistors-on-foil demonstrators with the developed foil-on-carrier lamination and imaging technology. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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