Modeling Chemical Vapor Deposition (CVD) Diamond Film Growth with Diamantane-Derived Radicals in Solution: Permissive Evidence in Support of the Garrison−Brenner Mechanism for Incorporation of Carbon into the Dimer Sites of the {100} Diamond Surface

Autor:	Robert F. Campbell, and Allen D. Aloise, Ken S. Feldman, Theodore R. West, David M. Giampetro
Rok vydání:	1999
Předmět:	Material properties of diamond Dimer Radical Organic Chemistry Diamond chemistry.chemical_element Chemical vapor deposition engineering.material Photochemistry chemistry.chemical_compound Carbon film chemistry engineering Organic chemistry Carbon Diamantane
Zdroj:	The Journal of Organic Chemistry. 64:7612-7617
ISSN:	1520-6904 0022-3263
Popis:	The synthesis and partial rearrangement of nordiamantanemethyl radical into its more stable diamantyl isomer at 200−300 °C is reported. This solution phase observation attests to the feasibility of similar processes proposed to occur at the surface of {100} diamond film under CVD conditions.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::96bc0871623aa97a5e02bdf82d678a7e https://doi.org/10.1021/jo9911793 Zobrazit plný text záznamu