Variable sensitivity Moiré interferometry using binary optic technology
| Autor: | John A. Gilbert, Helen Johnson-Cole, James H. Bennewitz |
|---|---|
| Rok vydání: | 1994 |
| Předmět: |
Materials science
business.industry Mechanical Engineering Binary number Ranging Moiré pattern Surface displacement Grating Atomic and Molecular Physics and Optics Electronic Optical and Magnetic Materials Optics Sensitivity (control systems) Electrical and Electronic Engineering business Moire interferometry Variable (mathematics) |
| Zdroj: | Optics and Lasers in Engineering. 20:241-257 |
| ISSN: | 0143-8166 |
| DOI: | 10.1016/0143-8166(94)90029-9 |
| Popis: | This paper demonstrates the feasibility of optical microlithography as a grating production method for use in variable sensitivity moire interferometry. In this study, a crossed, binary, phase-type grating is produced and replicated onto the surface of the test piece. Moire interferograms are recorded with sensitivities ranging from 2.0 to 0.40 μm/fringe. Generalized expressions are given for variable sensitivity moire interferometry, and experimental tests are conducted to verify analytical arguments. In one of these tests, two different diffraction order pairs are used simultaneously to verify that surface displacement can be measured at different sensitivities. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|