Incipient amorphous-to-crystalline transition in HfO2 as a function of thickness scaling and anneal temperature
| Autor: | Patrick S. Lysaght, M. Alper Sahiner, Byoung Hun Lee, Raj Jammy, Joseph C. Woicik |
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| Rok vydání: | 2008 |
| Předmět: |
Diffraction
Materials science Extended X-ray absorption fine structure Analytical chemistry Condensed Matter Physics Nanocrystalline material Electronic Optical and Magnetic Materials Amorphous solid Crystallography Materials Chemistry Ceramics and Composites Absorption (electromagnetic radiation) High-resolution transmission electron microscopy Scaling Deposition (law) |
| Zdroj: | Journal of Non-Crystalline Solids. 354:399-403 |
| ISSN: | 0022-3093 |
| DOI: | 10.1016/j.jnoncrysol.2007.07.050 |
| Popis: | A series of 1.4, 1.8, and 4.0 nm thick HfO 2 films deposited on Si(1 0 0) substrates have been measured by extended X-ray absorption fine-structure prior to anneal processing, following a standard post deposition anneal of 700 °C for 60 s in NH 3 ambient, and following an additional rapid thermal anneal cycle of 1000 °C for 10 s in N 2 ambient. Analysis of the second coordination shell gives clear evidence of increased ordering with increasing film thickness at each temperature. Similarly, increased ordering with increasing anneal temperature is evident for each film thickness. Although X-ray diffraction and high resolution transmission electron microscopy indicated the 1.4 nm HfO 2 samples to be amorphous, EXAFS has distinguished nanocrystalline from amorphous states for these films. |
| Databáze: | OpenAIRE |
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