Advanced Cu Interconnection via Electroless-Plated Ni Interlayer on the Gate of Oxide Thin-Film Transistors

Autor:	Tae Hyoung Moon, Soon Sung Yoo, Woo Sup Shin, Seung Hee Nam, Seongil Im, Myoung Su Yang, Kyoung Ha Lee, Kyu Whang Lee
Rok vydání:	2014
Předmět:	Interconnection chemistry.chemical_compound Materials science chemistry business.industry Thin-film transistor Oxide Optoelectronics business Electronic Optical and Magnetic Materials
Zdroj:	ECS Journal of Solid State Science and Technology. 3:Q190-Q194
ISSN:	2162-8777 2162-8769
DOI:	10.1149/2.00814410jss
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::95fa128e74a6a02fe02642bb5de9e114 https://doi.org/10.1149/2.00814410jss Zobrazit plný text záznamu