Properties of positive resists. III. The dissolution behavior of poly(methyl methacrylate-co-maleic anhydride)
Autor: | Gail L. Boydston, Nicholas A. Peppas, Rashmi K. Drummond |
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Rok vydání: | 1990 |
Předmět: |
chemistry.chemical_classification
Materials science Ketone Polymers and Plastics Maleic anhydride General Chemistry Poly(methyl methacrylate) Surfaces Coatings and Films chemistry.chemical_compound Chemical engineering chemistry visual_art Polymer chemistry Materials Chemistry Copolymer medicine visual_art.visual_art_medium Swelling medicine.symptom Methyl methacrylate Dissolution Layer (electronics) |
Zdroj: | Journal of Applied Polymer Science. 39:2267-2277 |
ISSN: | 1097-4628 0021-8995 |
DOI: | 10.1002/app.1990.070391107 |
Popis: | The dissolution characteristics of model positive resists were investigated through the use of various copolymers of methyl methacrylate and maleic anhydride. Dissolution in methyl ethyl ketone was found to be dependent on the radiation dose and on the composition of the copolymers. The Lee–Peppas dissolution model was used to calculate important parameters of this dissolution process. It was shown that the overall dissolution rate was initially controlled by the swelling process whereas the true disentanglement/dissolution process predominated during the latter portion of the overall phenomenon. In addition, the thickness of the formed gel layer was a function of the square root of time. |
Databáze: | OpenAIRE |
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