Control of Plasma Etch Profiles with Plasma Sheath Electric Field and RF Power Density
| Autor: | C. B. Zarowin, R. S. Horwath |
|---|---|
| Rok vydání: | 1982 |
| Předmět: |
Debye sheath
Plasma etching Materials science Renewable Energy Sustainability and the Environment business.industry Plasma etcher Condensed Matter Physics Surfaces Coatings and Films Electronic Optical and Magnetic Materials symbols.namesake Electric field Materials Chemistry Electrochemistry symbols Optoelectronics Capacitively coupled plasma Plasma channel Reactive-ion etching Inductively coupled plasma business |
| Zdroj: | Journal of The Electrochemical Society. 129:2541-2547 |
| ISSN: | 1945-7111 0013-4651 |
| DOI: | 10.1149/1.2123602 |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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