Rapid growth of diamond and its morphology by in-liquid plasma CVD
| Autor: | Chiaki Terashima, Hiroshi Uetsuka, Kazuya Nakata, Makoto Yuasa, Akira Fujishima, Ryota Hishinuma, Takeshi Kondo, Harada Yohei |
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| Rok vydání: | 2016 |
| Předmět: |
congenital
hereditary and neonatal diseases and abnormalities Materials science Morphology (linguistics) Nanotechnology 02 engineering and technology Chemical vapor deposition engineering.material 01 natural sciences hemic and lymphatic diseases parasitic diseases 0103 physical sciences Materials Chemistry Liquid plasma Growth rate Electrical and Electronic Engineering 010302 applied physics Mechanical Engineering food and beverages Diamond General Chemistry Plasma 021001 nanoscience & nanotechnology Electronic Optical and Magnetic Materials body regions Carbon film Microcrystalline Chemical engineering engineering 0210 nano-technology |
| Zdroj: | Diamond and Related Materials. 63:12-16 |
| ISSN: | 0925-9635 |
| DOI: | 10.1016/j.diamond.2015.10.009 |
| Popis: | Diamond synthesis and its morphology by in-liquid plasma chemical vapor deposition (CVD) method are investigated in this study. Diamond films were grown on Si substrates from mixed alcohol solution. Very high growth rate of 170 μm/h was achieved by this method. Microcrystalline and nanocrystalline diamond films were formed in different conditions. In the case of microcrystalline film, the shapes of diamond grains depend on the location in the film. All morphological differences in this study can be explained by the same mechanism of conventional gas phase CVD method. It means diamond morphology by in-liquid plasma CVD method can be controlled by process parameters as well as gas phase CVD method. |
| Databáze: | OpenAIRE |
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