Investigation of optimized ohmic contact of direct ITO layer with synchrotron radiation analysis
Autor: | Jeong Soo Lee, Taehyeong Kim, Kyuho Park, Jun-Seok Ha, Jun-Ho Jang, Jong-Jae Jung, Minho Joo, Hyun-Joon Shin |
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Rok vydání: | 2006 |
Předmět: | |
Zdroj: | physica status solidi c. 3:1828-1831 |
ISSN: | 1610-1642 1862-6351 |
DOI: | 10.1002/pssc.200565179 |
Popis: | With application of the current transport enhanced layer (CTEL) on the top of p-type GaN, we optimized process conditions, which show the contact resistance of 1.43x10–3 Ω·cm2, using ITO contact layer that has advantages in the enhancement of light extraction efficiency. High-resolution near edge X-ray absorption spectroscopy was used to investigate the interface reaction between GaN / CTEL and ITO layers. Interstitial molecular N2 was directly observed by vibrationally resolved N'K-edge absorption spectroscopy. It is suggested that GaN was chemically changed to gallium oxide (Ga2O3) and nitrogen molecule (N2) [2Ga-N + 3/2 O2 => Ga2O3+N2] during annealing process, and this newly formed layer makes depletion width narrowing for the tunneling properties for the ohmic contact. (© 2006 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim) |
Databáze: | OpenAIRE |
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