Evaluation of Cu Contamination Induced Pit Failure and Improvement by Hydrogen Anneal and Epitaxial Growth

Autor:	Yoji Mashiko, Kazuhito Matsukawa, Hidekazu Yamamoto, T. Katayama, Koji Fukumoto, Yasuhiro Kimura
Rok vydání:	2008
Předmět:	Materials science Hydrogen chemistry Metallurgy Electrochemistry chemistry.chemical_element Contamination Epitaxy
Zdroj:	Electrochemistry. 76:661-665
ISSN:	2186-2451 1344-3542
DOI:	10.5796/electrochemistry.76.661
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::95b89b8dad7397c3ffff78657b98b906 https://doi.org/10.5796/electrochemistry.76.661 Zobrazit plný text záznamu