Acoustical force nanolithography of thin polymer films
| Autor: | F. J. Rubio-Sierra, Marc Hennemeyer, Wolfgang M. Heckl, Ayhan Yurtsever, Robert W. Stark |
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| Rok vydání: | 2006 |
| Předmět: |
Nanostructure
Fabrication Materials science Plane wave Nanotechnology Surfaces and Interfaces Acoustic wave Condensed Matter Physics Surfaces Coatings and Films Electronic Optical and Magnetic Materials Nanolithography Resist Materials Chemistry Electrical and Electronic Engineering Thin film Lithography |
| Zdroj: | physica status solidi (a). 203:1481-1486 |
| ISSN: | 1862-6319 1862-6300 |
| DOI: | 10.1002/pssa.200566152 |
| Popis: | Nanomachining of thin polymer resist films with an atomic force microscope (AFM) is a promising route for the fabrication of nanoscale devices. In order to enhance the controllability of the nanomachining process an in-plane acoustic wave is coupled to the sample support. This enhances the intermittent force exerted by the AFM tip. The lateral resolution reached by this method is only limited by the physical size of the AFM tip to dimensions far below the light diffraction limit. The main process parameters are the frequency and magnitude of the acoustic wave, and the preloading force. In this work, the feasibility of acoustical force lithography and the influence of the relevant parameters are investigated. |
| Databáze: | OpenAIRE |
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