High surface smoothening of diamond HPHT (100) substrates
| Autor: | Julien Barjon, M.-A. Pinault, Nada Habka, Philippe Bergonzo, A. Ben-Younes, Christine Mer-Calfati |
|---|---|
| Rok vydání: | 2009 |
| Předmět: |
Materials science
Plasma etching Mineralogy Diamond Substrate (chemistry) Surfaces and Interfaces Plasma Chemical vapor deposition Surface finish engineering.material Condensed Matter Physics Surfaces Coatings and Films Electronic Optical and Magnetic Materials Ion implantation Chemical engineering Etching (microfabrication) Materials Chemistry engineering Electrical and Electronic Engineering |
| Zdroj: | physica status solidi (a). 206:1955-1959 |
| ISSN: | 1862-6300 |
| DOI: | 10.1002/pssa.200982232 |
| Popis: | The aim of this work is to study the influence of (100) substrate pre-treatment before boron doped homoepitaxial diamond growth. Atomic force microscopy measurements were made on (100) Ib HPHT and (100) IIa chemical vapour deposition commercially available substrates after the classical acid cleaning and before any growth or treatment. The (100) Ib HPHT substrates exhibit the most reproducible surfaces (on both sides). Different treatments before growth were performed on this type of substrates (hydrogen plasma etching, ion implantation, etc.). We show that a combined ion implantation and H 2 plasma etching pre-treatment improves drastically the substrate roughness, with values as low as 0.2 nm readily obtained. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Plný text