Measurement of Inorganic Acidic Gases and Particles from the Stack of Semiconductor and Optoelectronic Industries
| Autor: | Cheng Hsiung Huang, Chuen-Tinn Tsai, Yung Tai Ho |
|---|---|
| Rok vydání: | 2005 |
| Předmět: |
Detection limit
Chemistry business.industry Calibration curve Process Chemistry and Technology General Chemical Engineering technology industry and agriculture Analytical chemistry Exhaust gas Filtration and Separation Sulfuric acid Hydrochloric acid General Chemistry equipment and supplies chemistry.chemical_compound Hydrofluoric acid Nitric acid Optoelectronics business Phosphoric acid |
| Zdroj: | Separation Science and Technology. 39:2223-2234 |
| ISSN: | 1520-5754 0149-6395 |
| Popis: | A method for sampling inorganic acids in the exhaust gas of semiconductor and optoelectronic industries was developed by using a porous metal denuder and an ion chromatograph analysis. The sampler consists of a Teflon filter to collect inorganic acidic aerosols followed by two coated porous metal discs for sampling inorganic acidic gases. The second disc was used to check if the gas broke through the first disc. The method detection limit of the sampler is appropriate for sampling the exhausted gas at semiconductor or photoelectric industries. Test results indicated that the calibration curves had good coefficients of correlation, and the concentrations of the laboratory and field blanks were found to be lower than the method detection limit. For the semiconductor and optoelectronic industries, the total concentration of acidic gases and particles for hydrofluoric acid, hydrochloric acid, nitric acid, phosphoric acid, and sulfuric acid was found to be 85–999, 40–820, 21–223, ND (not detectable)–4... |
| Databáze: | OpenAIRE |
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