Advanced 300mm 130nm BCD technology from 5V to 85V with Deep-Trench Isolation

Autor: Dong Ke, Michael Tiong, Raj Verma Purakh, Ong Shiang Yang, Liu Kun, Koo Jeoung Mo, Mun Nam Chil, Rajesh R. Nair
Rok vydání: 2016
Předmět:
Zdroj: 2016 28th International Symposium on Power Semiconductor Devices and ICs (ISPSD).
DOI: 10.1109/ispsd.2016.7520863
Popis: This paper demonstrates an advanced 300mm 130nm BCD (Bipolar-CMOS-DMOS) automotive grade platform with high modularity. The platform offers logic-devices, flash-devices and high performance power devices with rated voltages up to 85V as well as complimentary analog devices such as a BJT, MIM and Poly Resistor. The power devices in the process have best-in-class specific on-resistance and wide safe operating region. In addition, Deep-Trench Isolation (DTI) and highly doped n-buried layers are introduced to ensure much better immunity to parasitic coupling effects and isolation between sensitive devices and power stages.
Databáze: OpenAIRE