Study on the Shock Sensitivity of the Hydrolysis Products of Hexachlorodisilane
| Autor: | Mark A. Wanous, Donald V. Eldred, Xiaobing Zhou, Thomas L. Sanders, Xianghuai Wang |
|---|---|
| Rok vydání: | 2018 |
| Předmět: |
Hydrogen
Silicon 010405 organic chemistry General Chemical Engineering Hexachlorodisilane chemistry.chemical_element General Chemistry 010402 general chemistry Photochemistry 01 natural sciences Redox Industrial and Manufacturing Engineering 0104 chemical sciences Shock (mechanics) Hydrolysis Silanol chemistry.chemical_compound Shock sensitivity chemistry |
| Zdroj: | Industrial & Engineering Chemistry Research. 57:10354-10364 |
| ISSN: | 1520-5045 0888-5885 |
| DOI: | 10.1021/acs.iecr.8b01241 |
| Popis: | The hydrolysis products of hexachlorodisilane (HCDS) show common heat sensitivity and can become shock sensitive under certain conditions. Study of the shock sensitivity has been difficult due to the unpredictable nature of this phenomenon. We have identified the parameters affecting the shock sensitivity of the materials and developed synthetic methods to consistently prepare the hydrolysis products with a high shock sensitivity. We characterized the composition of the hydrolysis products to be [SiOx(OH)4–2x]m[Si2Oy(OH)6–2y]n(H2O)o where x is 0–2, y is 0–3, m is less than n, and o varies. The hydrogen atoms in the silanol groups or absorbed water are the oxidant and the silicon atoms in the Si–Si bonds are the reductant. When the materials are disturbed by a thermal or mechanical impact, fast redox reactions happen to form molecular hydrogen. A sequence of free radical reactions was proposed to explain the shock sensitivity and shock-induced chemical transformation. |
| Databáze: | OpenAIRE |
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