Optical angular scatterometry: In-line metrology approach for roll-to-roll and nanoimprint fabrication
| Autor: | Vineeth Sasidharan, Shrawan Singhal, S. R. J. Brueck, Sidlgata V. Sreenivasan, Ruichao Zhu, Alexander Neumann, Juan J. Faria-Briceno |
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| Rok vydání: | 2019 |
| Předmět: |
Materials science
Fabrication 02 engineering and technology 01 natural sciences Soft lithography Roll-to-roll processing law.invention Optics Nanomanufacturing law 0103 physical sciences Materials Chemistry Electrical and Electronic Engineering Instrumentation 010302 applied physics business.industry Process Chemistry and Technology Metamaterial Polarizer 021001 nanoscience & nanotechnology Surfaces Coatings and Films Electronic Optical and Magnetic Materials Metrology Nanolithography 0210 nano-technology business |
| Zdroj: | Journal of Vacuum Science & Technology B. 37:052904 |
| ISSN: | 2166-2754 2166-2746 |
| Popis: | Metrology is an essential aspect of nanomanufacturing. Increasingly, nanoscale three-dimensional features are demanded for advanced applications, increasing the demands on metrology. New fabrication techniques such as roll-to-roll (R2R) processes are being developed for manufacturing large-area nanotechnology products such as wire-grid polarizers (WGP), metal-mesh grids, and metamaterials. Angular scatterometry has demonstrated noncontact, optical capabilities for characterizing WGP and photoresist structures with sub-100 nm dimensions. However, existing implementations are not applicable to real-time R2R nanofabrication due to both a requirement of rotating a small sample over a range of angles and measurement times that are incompatible with a moving R2R web. This work demonstrates a high-speed approach (2.5 kHz scanning) to angular scatterometry where the optical beam is scanned rather than the sample mount. The design uses a scanning mirror and high numerical aperture (NA) optics to vary the incident angle over a range from ∼29° to ∼59°. Approaches to increase the angular range are discussed. The scatterometry results are in good agreement with off-line scatterometry results for plane surface, 1D, and 2D patterned samples. |
| Databáze: | OpenAIRE |
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