Metal-Assisted Chemical Etching of Silicon Using Oxygen as an Oxidizing Agent
| Autor: | Shinji Yae, Yuma Morii, Masato Enomoto, Naoki Fukumuro, Hitoshi Matsuda |
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| Rok vydání: | 2012 |
| Zdroj: | ECS Meeting Abstracts. :2371-2371 |
| ISSN: | 2151-2043 |
| Popis: | not Available. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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