Development of positive electron-beam chemical amplification resists using tetrahydropyranyl-protected polyvinylphenol

Autor:	Kohji Katoh, Michiaki Hashimoto, Hiroshi Shiraishi, Takumi Ueno, Toshio Sakamizu
Rok vydání:	1995
Předmět:	Materials science Polymers and Plastics Organic Chemistry Analytical chemistry Chemical amplification Trimethylsulfonium Photochemistry chemistry.chemical_compound chemistry Resist Materials Chemistry Cathode ray Dissolution Trifluoromethanesulfonate Inhibitory effect Lithography
Zdroj:	Journal of Photopolymer Science and Technology. 8:21-28
ISSN:	1349-6336 0914-9244
Popis:	Chemical amplification positive resists using tetrahydropyranyl-protected polyvinylphenol (THP-M) were investigated for electron-beam lithography. To enhance the resist performance, we used a new novolak resin and trimethylsulfonium triflate (MES) as an acid generator. The novolak resin has a large dissolution inhibition effect, and MES shows the dissolution promotion effect. Therefore, the resist composed of these systems showed the high performance. It resolved 0.3μm hole pattern with the aquous base development using an electron-beam lithography system with a dose of 4.7μC/cm2.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::93aa130ad7d6ae93477138b673e38906 https://doi.org/10.2494/photopolymer.8.21 Zobrazit plný text záznamu