Novel overlay correction by synchronizing scan speed to intra-die fingerprint on lithography scanner
| Autor: | Akihiro Nakae, Yoshinori Hagio, Manabu Takakuwa, Yosuke Takahata, Tsutomu Obata, Masakazu Hamasaki, Manabu Miyake, Katsuya Kato, Yoshimitsu Kato, Shunichi Nakao, Kentaro Kasa |
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| Rok vydání: | 2020 |
| Předmět: |
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Computer science business.industry ComputerSystemsOrganization_COMPUTER-COMMUNICATIONNETWORKS Fingerprint (computing) Synchronizing 02 engineering and technology Overlay Fingerprint recognition 021001 nanoscience & nanotechnology 01 natural sciences Metrology 010309 optics 0103 physical sciences Key (cryptography) 0210 nano-technology business Lithography Computer hardware |
| Zdroj: | 2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC). |
| DOI: | 10.1109/asmc49169.2020.9185339 |
| Popis: | Intra-die overlay is becoming one of the key challenges in high accuracy overlay. While recent progress of overlay metrology has made it viable to monitor intra-die overlay signature by nondestructive methods, traditional intra-field correction does not work well enough to reduce intra-die overlay error of lithography process. In this paper, we demonstrated for the first time that the intra-die overlay correction does work by synchronizing scan speed to intra-die fingerprint and this method is actually applicable to treat both lot-to-lot and intra-wafer variation of intra-die overlay. |
| Databáze: | OpenAIRE |
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