Autor: |
Takemi Komatsubara, Tomoko Kagayama, K. Iki, Nobuo Mōri, Gendo Oomi, Yoshichika Ōnuki |
Rok vydání: |
1994 |
Předmět: |
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Zdroj: |
Journal of Alloys and Compounds. :387-390 |
ISSN: |
0925-8388 |
DOI: |
10.1016/0925-8388(94)90940-7 |
Popis: |
The electrical resistivity ρ ( T ) of the concentrated Kondo compound URu 2 Si 2 has been measured at high pressure up to 80 kbar in order to examine the stability of the electronic state at high pressure. The pressure dependence of volume is also observed by X-ray diffraction. The Gruneisen parameters for the Neel temperature and the Kondo temperature are estimated on the basis of the results in the present work. The present analysis emphasizes the itinerant character of 5f electrons of URu 2 Si 2 . |
Databáze: |
OpenAIRE |
Externí odkaz: |
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