Electron hopping rate measurements in ITO junctions: Charge diffusion in a layer-by-layer deposited ruthenium(II)-bis(benzimidazolyl)pyridine-phosphonate–TiO2 film

Autor:	Frank Marken, Martin Pumera, Liza Rassaei, Charles Y. Cummings, Jay D. Wadhawan, Sara E. C. Dale, Masa-aki Haga, Simon J. Bending, Stephen C. Parker, Takuya Nakabayashi
Rok vydání:	2011
Předmět:	Stereochemistry General Chemical Engineering Diffusion Layer by layer Analytical chemistry Oxide chemistry.chemical_element Focused ion beam Analytical Chemistry Ruthenium chemistry.chemical_compound chemistry Electrode Electrochemistry Cyclic voltammetry Indium
Zdroj:	Journal of Electroanalytical Chemistry. 657:196-201
ISSN:	1572-6657
Popis:	Focused ion beam (FIB) machining allowed a sub-micron trench to be cut through tin-doped indium oxide (ITO) film on glass to give a generator – collector junction electrode with narrow gap (ca. 600 nm). A layer-by-layer deposited film composed of a dinuclear ruthenium(II)-bis(benzimidazolyl)pyridine-phosphonate (as the negative component) and nanoparticulate TiO 2 (ca. 6 nm diameter, as the positive component) was formed and investigated first on simple ITO electrodes and then on ITO junction electrodes. The charge transport within this film due to Ru(II/III) redox switching (electron hopping) was investigated and an apparent diffusion coefficient of ca. D app = 2 (± 1) × 10 −15 m 2 s −1 was observed with minimal contributions from intra-molecular Ru–Ru interactions. The benefits of FIB-cut ITO junctions as a tool in determining charge hopping rates are highlighted.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::9370f647a5d7db755cf8ea8060846060 https://doi.org/10.1016/j.jelechem.2011.04.010 Zobrazit plný text záznamu Full Text from ScienceDirect