| Autor: |
Frederic Boeuf, S. Manakli, A. Beverina, M. Broekaart, J. Todeschini, M. Jurdit, Daniel Henry, Francois Leverd, Stephane Denorme, Pascal Gouraud, Ph. Brun, V. Wang, G. Bervin, V. De Jonghe, Blandine Minghetti, Laurent Pain, B. Icard |
| Rok vydání: |
2005 |
| Předmět: |
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| Zdroj: |
SPIE Proceedings. |
| ISSN: |
0277-786X |
| Popis: |
With the strong increase of mask complexity and associated price for each new technology node, mask less lithography represents more and more an interesting and complementary alternative for ASIC manufacturing especially in the fields of low volume and leading eadge technology applications. In the semiconductor business where prices and cycle time are constantly pressured, the capability and flexibility of the electron beam direct write offer an effective real cost and cycle time opportunity thanks to its high-resolution capability but also to its ability to print, modify or correct design everywhere in a circuit. This paper highlights application examples where the advantages of this lithography solution are demonstrated for advanced research and development application with the patterning of 45 nm SRAM and for the fast validation of architecture designs. This work confirms that mask less lithography can be transparently placed into production environment, in association with the "golden" optical lithography reference. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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