In situ deposition of MgB2 thin films by magnetron cosputtering and sputtering combined with thermal evaporation
| Autor: | J. Geerk, B. Obst, G. Linker, A. G. Zaitsev, F. Ratzel, Rudolf Schneider |
|---|---|
| Rok vydání: | 2005 |
| Předmět: |
Materials science
Annealing (metallurgy) Transition temperature Analytical chemistry Energy Engineering and Power Technology Sputter deposition Condensed Matter Physics Evaporation (deposition) Electronic Optical and Magnetic Materials Sputtering Cavity magnetron Sapphire Electrical and Electronic Engineering Thin film |
| Zdroj: | Physica C: Superconductivity and its Applications. 423:89-95 |
| ISSN: | 0921-4534 |
| Popis: | We report on two approaches to the in situ synthesis of superconducting MgB 2 thin films. In the first approach, Mg and B were simultaneously sputtered from two separate planar targets. The substrate temperature T s was limited to a small range of 290–320 °C. The resulting films on sapphire substrates were c -axis textured with low growth quality. Their transition temperature T c reached a maximum of 24 K with a transition width of 0.6 K. A short-time in situ annealing at 600 °C improved T c to 28 K. In the second approach, the Mg sputter source was replaced by a specially designed Mg evaporator. Due to this intense Mg source T s could be increased to 440 °C, and T c of the “as-grown” films rose to 33 K. Short-time in situ annealing after the film deposition enhanced T c to 36 K. For these films we also measured a high critical current density of 15 MA/cm 2 at 6 K. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Full Text from ScienceDirect