| Popis: |
A non-contact vacuum-patterning method is described to sublime OLED materials from a donor to a substrate. Radiation-induced sublimation transfer (RIST) enables the manufacture of full-color OLED devices on large-scale mother glass, at high yield, by eliminating precision shadow masks and donor contact, which are used in evaporation and laser-induced thermal imaging, respectively. Device performance (color, efficiency, stability) is reported for RIST devices and evaporated controls; comparisons to evaporation and other patterning methods are described, and a full-color AM-OLED device was fabricated. |
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