Applications of the Technology of Fast Neutral Particle Beams in Micro- and Nanoelectronics
| Autor: | V. P. Kudrya, Yu. P. Maishev |
|---|---|
| Rok vydání: | 2018 |
| Předmět: |
010302 applied physics
Materials science Nanotechnology 02 engineering and technology 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences Electronic Optical and Magnetic Materials Nanoelectronics Sputtering Etching (microfabrication) 0103 physical sciences Materials Chemistry Deposition (phase transition) Electrical and Electronic Engineering Thin film 0210 nano-technology Neutral particle Layer (electronics) Beam (structure) |
| Zdroj: | Russian Microelectronics. 47:332-343 |
| ISSN: | 1608-3415 1063-7397 |
| DOI: | 10.1134/s1063739718050049 |
| Popis: | A brief review of the results of the application of fast neutral particle (FNP) beam sources in the field of the production technology of micro- and nanoelectronic devices published in the literature is presented. Processes such as surface cleaning; sputtering and etching of insulators, simiconductors, and metals; layer-by-layer etching; deposition of thin films directly from beams or by sputtering, and neutral-beam-enhanced deposition; oxidation, nitridation, and fluorination of a near-surface layer; production of the elements of micro- and nanoelectromechanical devices; nanostructuring; and modification of self-assembled organic molecular structures are considered. In addition, the results of investigating a decrease in the degree of degradation of the electrophysical properties of materials and electrical characteristics of device structures when passing from ion-beam technologies to FNP beams are discussed. |
| Databáze: | OpenAIRE |
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