ChemInform Abstract: GeMoW Refractory Ohmic Contact for GaAs/GaAlAs Self-Aligned Heterojunction Bipolar Transistors

Autor: C. Mayeux, J. F. Bresse, C. Besombes, P. Blanconnier, Y. Gao, P. Henoc, C. Dubon-Chevallier
Rok vydání: 1990
Předmět:
Zdroj: ChemInform. 21
ISSN: 0931-7597
DOI: 10.1002/chin.199030010
Popis: A study of the properties of As-doped and undoped GeMoW contacts prepared by different annealing techniques leads to the optimization of a new refractory ohmic contact consisting of an As-doped Ge-layer deposited by electron beam evaporation and sputter-deposited Mo and W films.
Databáze: OpenAIRE