| Popis: |
The design of the exposure region of an Electron‐Beam Microfabrication System is usually a compromise between beam formation, deflection, and registration signal collection. In systems where a post final lens deflection assembly is used, this region is inevitably restricted in space and access for signal collection becomes difficult. Annular planar detectors of the silicon semiconductor diode type have been used in these situations but are restricted in their range of electron energy response and noise performance. An attractive alternative is the channel plate electron multiplier which can be configured into a compact annular assembly with low profile (6 mm). Additionally, it is sensitive to low energy secondary, and high energy backscattered electrons and can be made selectively sensitive to the higher energy electrons alone by suitable biasing. In the design implementation described, an annular channel plate is provided with a signal collection plate and electronic drive scheme to decouple the output s... |
