Nanotribological behavior of thermal treatment of zinc titanate thin films
| Autor: | Shyh-Chi Wu, Wei-Hung Yau, Chien-Huang Tsai, Chang-Pin Chou |
|---|---|
| Rok vydání: | 2012 |
| Předmět: |
Materials science
Silicon Analytical chemistry chemistry.chemical_element Surfaces and Interfaces General Chemistry Substrate (electronics) Thermal treatment Condensed Matter Physics Surfaces Coatings and Films Amorphous solid Grain growth Crystallinity chemistry.chemical_compound chemistry X-ray photoelectron spectroscopy Materials Chemistry Zinc titanate |
| Zdroj: | Surface and Interface Analysis. 44:1314-1318 |
| ISSN: | 0142-2421 |
| DOI: | 10.1002/sia.5019 |
| Popis: | We present a study of the nanotribological behavior of ZnTiO3 films; the surface morphology, stoichiometry, and friction (μ) were analyzed using atomic force microscopy, X-ray photoelectron spectroscopy, and nanoscratch system. It is confirmed that the measured values of H and μ of the ZnTiO3 films were in the range from 8.5 ± 0.4 to 5.6 ± 0.4 GPa and from 0.164 to 0.226, respectively. It is suggested that the hexagonal ZnTiO3 decomposes into cubic Zn2TiO4 and rutile TiO2 based on the thermal treatment; the H, μ, and RMS were changed owing to the grain growth and recovery that results in a relax crystallinity of ZnTiO3 films. From X-ray photoelectron spectroscopy measured, core levels of O 1 can attribute the weaker bonds as well as lower resistance after thermal treatment. The XRD patterns showed that as-deposited films are mainly amorphous; however, the hexagonal ZnTiO3 phase was observed with the ZnTiO3 (104), (110), (116), and (214) peaks from 620 to 820 °C, indicating that there is highly (104)-oriented ZnTiO3 on the silicon substrate. Copyright © 2012 John Wiley & Sons, Ltd. |
| Databáze: | OpenAIRE |
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