Possibility of Low Temperature Growth of YBCO Thin Film by Low Energy Ion Assisted Deposition

Autor: Tsutom Yotsuya, Soichi Ogawa, Yoshihiko Suzuki, Masao Noma, Masami Nakasone
Rok vydání: 1993
Předmět:
Zdroj: Advances in Superconductivity V ISBN: 9784431683070
DOI: 10.1007/978-4-431-68305-6_224
Popis: Our aim of study has been to realize a superconducting YBCO thin film growth on versatile substrate such as stainless steel, Si wafer or glass substrate by reducing the substrate temperature. In order to realize above purpose, we have developed a three source electron beam evaporation system, in which pure metal sources were adopted. Oxygen radicals exited by an RF multi-capillary ion source were irradiated onto the substrate during deposition. Even though the metal composition of each film was off-stoichiometry(Y:Ba:Cu=l: 1.6:3.7), the Tco of YBCO thin film were 72 K for MgO substrate, 63 K for SUS304 sheet, 64 K for glass substrate, respectively. The reaction between YBCO and each substrate was significantly reduced by means of relatively low substrate temperature of 565 °C. The improvement of Tc will be made by adjusting the film composition and deposition conditions.
Databáze: OpenAIRE