Experimental Analysis of Process Impacts on Fluorine Incorporated Gate Oxide Film Properties Near Gate Edge Region

Autor:	Shuntaro Fujii, Isao Maru, Soichi Morita, Tsutomu Miyazaki
Rok vydání:	2022
Zdroj:	2022 6th IEEE Electron Devices Technology & Manufacturing Conference (EDTM).
DOI:	10.1109/edtm53872.2022.9798309
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::915f9b3834ed8fa6e9bd39610ade4598 https://doi.org/10.1109/edtm53872.2022.9798309 Zobrazit plný text záznamu