Influence of He ion etching on superconducting transition temperature and critical current density of Bi1.6Pb0.4Sr2Ca2Cu3Ox
Autor: | Tetsuji Tanihira, Yoshitake Nishi, Toshio Shima, Kageyoshi Sakamoto, N. Inoue, Hirokazu Ishii |
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Rok vydání: | 1994 |
Předmět: | |
Zdroj: | Journal of Advanced Science. 6:11-13 |
ISSN: | 1881-3917 0915-5651 |
Popis: | It is a serious problem that excess helium-ion etching greatly deceases superconducting transition temperature (Tc) and critical current density (Jc) of Bi1.6Pb0.4Sr2Ca2Cu3Ox. Thus, the influence of the etching on Tc and Jc has been investigated for the Bi oxide. A critical DOSE (Dc) to maintain high Tc above 100K is defined and evaluated. The Dc value is about 3.2×1017(ions/mm2) for the helium-ion etching. |
Databáze: | OpenAIRE |
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