Direct patterning of polysilanes and polygermanes using interference lithography

Autor:	Eva A. Dias, Kim M. Baines, Yun Yang, Cheng Lu, Robert H. Lipson
Rok vydání:	2011
Předmět:	Inorganic Chemistry Chemistry Nanotechnology General Chemistry Interference lithography
Zdroj:	Applied Organometallic Chemistry.
ISSN:	0268-2605
DOI:	10.1002/aoc.1821
Popis:	The direct patterning of poly(p-methoxyphenylmethylsilane) (PMPMS) and poly(p-methoxyphenylmethylgermane) (PMPMG) by interference lithography is reported. Copyright © 2011 John Wiley & Sons, Ltd.
Databáze:	OpenAIRE
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