Nanometer resolusion three-dimensional microprobe RBS analyses by using a 200 kV focused ion beam system

Autor:	Mikio Takai, Ryo Mimura, Hirosuke Takayama
Rok vydání:	2003
Předmět:	Nuclear and High Energy Physics Microprobe Materials science Ion beam business.industry Nondestructive analysis Lateral resolution Microanalysis Focused ion beam Optics Nanometre Spectroscopy business Instrumentation
Zdroj:	Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 210:104-107
ISSN:	0168-583X
DOI:	10.1016/s0168-583x(03)01044-9
Popis:	Three-dimensional Rutherford backscattering (RBS) analyses have been achieved in the nanometer range for both lateral and vertical resolution using a 200 kV focused ion beam (FIB) system. The ion-optical design of the FIB microprobe RBS analysis system in Osaka University has been modified, and it is confirmed that the focusing performance of less than 20 nm lateral resolution is obtained with 300 keV Be2+ ion beam. Three-dimensional microprobe RBS analyses have been performed on a sample that has a structure with 2 layers of 10 nm thick Pt gratings separated vertically by a 25 nm thick SiO2 layer and offset 90° each other. The Pt gratings consist of 0.5 μm width lines and 2 μm intervals. The RBS mapping and tomography images clearly show the three-dimensional fine structures of the sample.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::91161cf31adfb7e9e96eaecee16336d4 https://doi.org/10.1016/s0168-583x(03)01044-9 Zobrazit plný text záznamu Full Text from ScienceDirect