A new method of fabrication of all-metal tips for field emission arrays

Autor:	V.V. Kolosov, M.V. Gavrilov, V.V. Prokhorov, A.A. Khazanov, B.N. Mironov
Rok vydání:	2002
Předmět:	Materials science Fabrication Argon business.industry Analytical chemistry chemistry.chemical_element Plasma Sputter deposition Cathode law.invention Field electron emission chemistry law Sputtering Optoelectronics business Diode
Zdroj:	9th International Vacuum Microelectronics Conference.
DOI:	10.1109/ivmc.1996.601851
Popis:	A new method of fabrication of metal tips using an oxygen/argon plasma has been developed and the tips have been formed and tested in a magnetron sputtering diode. The tip cones obtained were quite uniform, with the height of the tips about 100-150 micron or 300-500 micron. The method may be applied for increasing the FEA reliability.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::9111a1b9ab019e7ec5d662a8ca7dd13d https://doi.org/10.1109/ivmc.1996.601851 Zobrazit plný text záznamu