The structural, chemical and compositional nature of amorphous silicon carbide films
| Autor: | S. H. Baker, T. J. Dines, S. E. Hicks, A. G. Fitzgerald |
|---|---|
| Rok vydání: | 1990 |
| Předmět: |
Amorphous silicon
Auger electron spectroscopy General Chemical Engineering Analytical chemistry General Physics and Astronomy Chemical vapor deposition Silane Amorphous solid Secondary ion mass spectrometry chemistry.chemical_compound symbols.namesake chemistry X-ray photoelectron spectroscopy symbols Raman spectroscopy |
| Zdroj: | Philosophical Magazine B. 62:193-212 |
| ISSN: | 1463-6417 1364-2812 |
| DOI: | 10.1080/13642819008226986 |
| Popis: | A range of amorphous hydrogenated silicon-carbide films have been produced using the plasma-enhanced chemical-vapour deposition technique with silane and methane diluted in hydrogen as the parent molecules. The air-exposed and sputter-cleaned surfaces of these films have been investigated by means of X-ray photoelectron spectroscopy. Auger electron spectroscopy, secondary-ion mass spectrometry, Raman spectroscopy and reflection-electron diffraction. The structural and chemical nature of the films has been determined as a function of the methane: silane ratio by a combination of the above techniques. X-ray photoelectron spectroscopy and Auger electron spectroscopy have been used to determine the carbon content of the films also as a function of the methane: silane ratio. |
| Databáze: | OpenAIRE |
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