Comparison of AuNi5 films deposited by laser ablation and sputtering for RF MEMS switch contacts
| Autor: | Amr M. Shaarawi, Noha Sameh Farghal, Philippe Soussan |
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| Rok vydání: | 2011 |
| Předmět: |
Laser ablation
Materials science business.industry Contact resistance Analytical chemistry Sputter deposition Condensed Matter Physics Microstructure Indentation hardness Evaporation (deposition) Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials Pulsed laser deposition Sputtering Optoelectronics Electrical and Electronic Engineering business |
| Zdroj: | Microelectronic Engineering. 88:268-272 |
| ISSN: | 0167-9317 |
| DOI: | 10.1016/j.mee.2010.11.007 |
| Popis: | AuNi5 films, commonly deposited by sputtering and evaporation, are used in microswitches as an alternative to Au contacts for their smaller contact adhesion. In this work, we investigate whether Pulsed Laser Deposition (PLD) is suitable for the deposition of RF MEMS switch contact materials by comparing the properties and performance of AuNi5 films produced by PLD to films of similar thickness deposited by sputtering. We compare films' chemical composition, microstructure, stress, hardness and contact force versus contact resistance characteristics using films of different physical properties. We concluded that for PLD films to be used as switch contacts, they need to have as small particulate density as possible to provide reliable performance, which indicates reproducibility of experimental results when using equipment with the same settings on contact films deposited at the same conditions. |
| Databáze: | OpenAIRE |
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