Manufacturing changes air ionization technology
Autor: | Arnold Steinman |
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Rok vydání: | 2015 |
Předmět: | |
Zdroj: | 2015 37th Electrical Overstress/Electrostatic Discharge Symposium (EOS/ESD). |
DOI: | 10.1109/eosesd.2015.7314759 |
Popis: | Manufacturing has brought increased semiconductor device functionality through smaller geometries, larger wafer sizes, and faster operating speeds, as well as increased disk drive storage density and display sizes. To produce these advanced technologies the use of air ionization for static control has changed. This paper explores new ionization requirements and methods. |
Databáze: | OpenAIRE |
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