High LIDT photosensitive organic-inorganic hybrid materials for nanoimprint lithography (Conference Presentation)

Autor:	Dimitris G. Papazoglou, Andrius Melninkaitis, Theodoros Tachtsidis, Areti Mourka, Maria Farsari, Vasileia Melissinaki
Rok vydání:	2020
Předmět:	Materials science law Organic inorganic Nanotechnology Multiphoton lithography Hybrid material Nanoimprint lithography law.invention
Zdroj:	Synthesis and Photonics of Nanoscale Materials XVII.
Popis:	Nanoimprint lithography (NIL) is a technique suitable for the mass production of micro-optical elements using a mould. One drawback, however, is that the materials used in NIL have low laser-induced damage threshold (LIDT). Here, we present our results in the development of a series of high-LIDT organic-inorganic hybrid materials, and their application in NIL using moulds made by multiphoton lithography.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::909d64a7ba6be473f0a0839119ddfec6 https://doi.org/10.1117/12.2544705 Zobrazit plný text záznamu