Isomerization model for photo-induced effects in a-Si:H

Autor: David Adler, Tadashi Shiraishi, Shumpei Yamazaki
Rok vydání: 1984
Předmět:
Zdroj: Journal of Non-Crystalline Solids. 68:167-174
ISSN: 0022-3093
DOI: 10.1016/0022-3093(84)90001-2
Popis: We report the results of new experimental data which indicate that oxygen impurities strongly enhance the Staebler-Wronski effect in a-Si:H films. These results suggest an isomerization model in which charged silicon dangling bonds are stabilized by hydrogen-like bonds between SiOH groups and the defect centers. Trapping of the photo-excited electrons and holes near the charged dangling bonds initiates a local structural relaxation that brings about the metastable light-soaked state. This model is consistent with a wide variety of data on photo-induced effects in a-Si:H.
Databáze: OpenAIRE