Enabling medium thick gate oxide devices in 22FDX® technology for switch and high-performance amplifier application
Autor: | Tom Herrmann, Alban Zaka, Zhixing Zhao, Binit Syamal, Wafa Arfaoui, Ruchil Jain, Ming-Cheng Chang, Sameer Jain, Shih Ni Ong |
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Rok vydání: | 2023 |
Předmět: | |
Zdroj: | Solid-State Electronics. 199:108512 |
ISSN: | 0038-1101 |
DOI: | 10.1016/j.sse.2022.108512 |
Databáze: | OpenAIRE |
Externí odkaz: |