Variable range hopping conductivity in Si:As bolometers

Autor: P. Fozooni, C.C. Zammit, M. J. Lea, A.D. Caplin, John Saunders, J. Kennefick
Rok vydání: 1990
Předmět:
Zdroj: Physica B: Condensed Matter. :317-318
ISSN: 0921-4526
Popis: The temperature dependent resistance R(T) of ion-implanted Si:As bolometers has been measured in the variable range hopping regime, with R(T) = CT 2m eχp( T m T ) m , for 1.6 > T > 0.2 K . The exponent m changed from 0.5 to 0.28 as the dopant concentration approached the metal-insulator transition. These sensitive bolometers, with an implant depth of 0.1 microns, are limited by the thermal contact between electrons and phonons below 0.1K.
Databáze: OpenAIRE