Variable range hopping conductivity in Si:As bolometers
Autor: | P. Fozooni, C.C. Zammit, M. J. Lea, A.D. Caplin, John Saunders, J. Kennefick |
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Rok vydání: | 1990 |
Předmět: | |
Zdroj: | Physica B: Condensed Matter. :317-318 |
ISSN: | 0921-4526 |
Popis: | The temperature dependent resistance R(T) of ion-implanted Si:As bolometers has been measured in the variable range hopping regime, with R(T) = CT 2m eχp( T m T ) m , for 1.6 > T > 0.2 K . The exponent m changed from 0.5 to 0.28 as the dopant concentration approached the metal-insulator transition. These sensitive bolometers, with an implant depth of 0.1 microns, are limited by the thermal contact between electrons and phonons below 0.1K. |
Databáze: | OpenAIRE |
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