Autor: |
Daniel A. Beaton, Angelo Mascarenhas, Aaron J. Ptak, Kirstin Alberi |
Rok vydání: |
2012 |
Předmět: |
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Zdroj: |
Journal of Crystal Growth. 351:37-40 |
ISSN: |
0022-0248 |
DOI: |
10.1016/j.jcrysgro.2012.04.028 |
Popis: |
We report on the lattice matched quaternary alloy, B y Ga 1 − y As 1 − x Bi x grown by molecular beam epitaxy at conditions conducive to bismuth incorporation. Incorporating a smaller atom (boron) along with the larger atom (bismuth) allows for a reduction of the epi-layer strain and lattice matching to GaAs for compositions of Bi : B ≃ 1.3 : 1 . The addition of boron flux does not significantly affect the bismuth incorporation and no change in the band gap energy is observed with increasing boron content. However, excess, non-substitutional boron is incorporated which leads to an increase in hole density, as well as an increase in the density of shallow in-gap states as observed by the loss of localization of photo-excited excitons. |
Databáze: |
OpenAIRE |
Externí odkaz: |
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