On the state of oxygen adsorbed on the surface of tungsten and molybdenum single crystals
| Autor: | B.A. Chuikov, N. P. Vas’ko, Yu.G. Ptushinskii |
|---|---|
| Rok vydání: | 1969 |
| Předmět: |
Materials science
Inorganic chemistry Analytical chemistry Oxide chemistry.chemical_element Surfaces and Interfaces Substrate (electronics) Tungsten Condensed Matter Physics Flashing Oxygen Surfaces Coatings and Films chemistry.chemical_compound Adsorption chemistry Molybdenum Desorption Materials Chemistry |
| Zdroj: | Surface Science. 14:448-456 |
| ISSN: | 0039-6028 |
| Popis: | The desorption kinetics of the atomic and oxide phases 1,2 ) have been studied to determine the composition of the surface film formed upon interaction of oxygen at low pressure with the surface of W and Mo single crystals. The results support the following ideas on the composition of an adsorbed film. Oxygen in the atomic state is present on the surface of all the substrates investigated irrespectively of their temperature during adsorption. Oxides are formed on the (100) planes of W and Mo during adsorption if the substrate temperature is high enough (~ 1000°K). If adsorption proceeds with the substrate at room temperature, the oxides in the desorption products are most likely due to the temperature rise during flashing, and the state on the substrate surface of the oxygen desorbed as oxides is unknown. On the (110) plane of W oxides are formed also at room temperature. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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