Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
| Autor: | Hassan Gargouri, Simone Brizzi, Małgorzata Kot, Irina Kärkkänen, Jessica Schneidewind, Dieter Schmeißer, Franziska Naumann, Karsten Henkel, Chittaranjan Das |
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| Rok vydání: | 2017 |
| Předmět: |
Materials science
Band gap Analytical chemistry chemistry.chemical_element 02 engineering and technology Surfaces and Interfaces General Chemistry Plasma 010402 general chemistry 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences Spectral line Synchrotron 0104 chemical sciences Surfaces Coatings and Films law.invention Atomic layer deposition chemistry law Materials Chemistry 0210 nano-technology Tin Spectroscopy Titanium |
| Zdroj: | Surface and Coatings Technology. 324:586-593 |
| ISSN: | 0257-8972 |
| Popis: | A comparative study of thin titanium oxynitride (TiOxNy) films prepared by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium (TDMAT) and N2 plasma as well as titanium(IV)isopropoxide and NH3 plasma is reported. The comparison is based on the combination of Ti2p core level and valence band spectroscopy and current-voltage measurements. The TDMAT/N2 process delivers generally higher fractions of TiN and TiON within the Ti2p spectra of the films and stronger photoemissions within the bandgap as resolved in detail by high energy resolution synchrotron-based spectroscopy. In particular, it is shown that higher TiN contributions and in-gap emission intensities correlate strongly with increased leakage currents within the films and might be modified by the process parameters and precursor selection. |
| Databáze: | OpenAIRE |
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