Sensitive Electron Beam Resist Systems Based On Acid-Catalyzed Deprotection

Autor:	Susan M. Sonchik, Cecilia Tsai, Kaolin N. Chiong, Hiroshi Ito, Lester A. Pederson
Rok vydání:	1989
Předmět:	chemistry.chemical_classification chemistry Acid catalyzed Resolution (electron density) chemistry.chemical_element Onium compound Manganese Polymer Photochemistry Absorption (electromagnetic radiation) Lithography Electron beam resist
Zdroj:	Advances in Resist Technology and Processing VI.
ISSN:	0277-786X
DOI:	10.1117/12.953013
Popis:	Poly(p-t-butoxycarbonyloxystyrene) (PBOCST) and poly(t-butyl p-vinylbenzoate) (PTBVB) provide sensitive, negative tone, electron beam resist systems when sensitized with "onium salt" acid generators. The sensitivity is high (0.5-2.5μC/cm 2 at 20 keV) owing to chemical amplification. The resolution and contrast are also high owing to the polarity change incorporated in the design. Development with an organic solvent provides sub-half-micrometer resolution.
Databáze:	OpenAIRE
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